Chinese Journal of Lasers, Volume. 12, Issue 12, 722(1985)
Recrystallization of polysilicon films by Ar+ laser irradiation
CW Ar+ laser is used for recrystallization of polysilicon films on isolating layers. Experimental results show a large increase in grain size, significant improvement in electrical properties and compatibility with conventional integrated circuit technology.
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Lin Chenglu, Shen Zongyong, Fang Fang, Lin Zixin, Zon Shichang. Recrystallization of polysilicon films by Ar+ laser irradiation[J]. Chinese Journal of Lasers, 1985, 12(12): 722