Two mechanisms of realizing dual-beam super-resolution optical recording are compared in this paper. One is super-resolution photoinduction-inhibited nanolithography (SPIN), and the other is stimulated emission depletion (STED). We establish a dynamic physical model of STED-based dual-beam super-resolution optical recording technology and study its mechanism in the photo-polymerization process. The differences in dot size and resolution between SPIN-based and STED-based dual-beam super-resolution optical recording technologies are simulated. The results show that the STED-based dual-beam super-resolution optical recording technology has the advantages of no inhibitor and simple principle, however, it needs higher dual-beam intensity and has lower inhibition efficiency of polymerization. In addition, the recording uniformity becomes more unsatisfactory and the dot size increases in the multi-point recording scenario. On the contrary, the SPIN-based dual-beam super-resolution optical recording technology requires much lower dual-beam intensity, and the initiator molecule consumption will cancel out the effect of the inhibitor molecule consumption, leading to great uniformity and stability under multi-point recording. Therefore, the SPIN-based dual-beam super-resolution optical recording technology has better prospect in the field of ultra-high density optical data storage.