In order to fabricate two-dimensional photonic crystal waveguides on silicon films, the design method and fabrication techniques were investigated. Firstly, the TE bands of the two-dimensional square lattice and triangular lattice air hole structures were calculated by using the plane wave expansion method，and the two-dimensional triangular lattice air hole structure was chosen. Then, by adding a line defect,the photonic band gaps of the two-dimensional triangular lattice were calculated also by using the plane wave expansion method. The reasonable photonic band gap whose normalized frequency was 0.295 7 was chosen, and the structure parameters of two dimensional photonic crystal waveguides used in the 1.55 μm were designed as the period of the lattice in 458 nm and the diameter of the air hole in 339 nm.Furthermore,the tolerances of structure paremeters were calculated as -3.95-5.65 nm. Finally, the photonic crystal waveguides were fabricated by using the focused ion beam etching. The testing shows that the period of the lattice is 463 nm, and the diameter of the hole is 344 nm, which are 5 nm larger than the design values，but still in the tolererce range.