Acta Optica Sinica, Volume. 19, Issue 2, 201(1999)
Parameter Study of Optical-Field Ionized Kr IX Plasma
Optical-field ionized plasma parameters are studied to find the optimum laser intensity for production of KrIX plasma suitable for the generation of collisionally excited XUV laser at 31.9 nm.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Parameter Study of Optical-Field Ionized Kr IX Plasma[J]. Acta Optica Sinica, 1999, 19(2): 201
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