Acta Optica Sinica, Volume. 16, Issue 10, 1493(1996)

Emittance Measurement of a High Brightness Pseudospark Produced Electron Beam

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less

    We report the emittance measurement of a electron beam produced in a pseudospark discharge device driven by a pulse line accelerator. A ten gap pseudospark device was operated at 200 kV, with anitrogen gas fill presure of 15 Pa. Small diameter (~1 mm) electron beam with current about 2 kA has been generated. The rms emittance of the beam is measured to be ε rms ≈ 48 mm·mrad about 5 cm downstream of the anode plane. The normalized emittance is then found to be ε n≈ 47 mm·mrad.

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Emittance Measurement of a High Brightness Pseudospark Produced Electron Beam[J]. Acta Optica Sinica, 1996, 16(10): 1493

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jul. 18, 1995

    Accepted: --

    Published Online: Dec. 4, 2006

    The Author Email:

    DOI:

    Topics