We have established a new equipment── physical jet deposition system (PJD), and successfully manufactured thin films such as C60, C70, PVK and PVK/C60 combination film by this new system. Based on the comparison of the absorption and photoluminescence (PL) spectra of these films with those of deposited films in normal high vacuum system, we found that the thin films with fine quality and high damage threshold can be made by this new PJD method. It is shown that PL decay behaviour of C60 PJD film is quite different from that of normal C60 film. In the PVK/C60 combination film, charge transfer complex has been observed.