Acta Optica Sinica, Volume. 31, Issue 12, 1222007(2011)
Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique
Photolithography resolution could be enhanced by the local enhancement effects of surface plasmon polaritons (SPP). Large-area periodic nanostructures could be fabricated by backside exposure SPP interference lithography. Resonance transmission of SPP in backside exposure system is analyzed, an optimum design method is proposed for silver superlens, and the intensity distribution of SPP interference lithography is simulated by finite difference time domain (FDTD) method and theoretic formulas. With optimum design of superlens thickness and resonance angle, a periodic silt array is obtained with better quality in laboratory.
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Xiao Xiao, Zhang Zhiyou, He Mingyang, Xiao Zhigang, Xu Defu. Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique[J]. Acta Optica Sinica, 2011, 31(12): 1222007
Category: Optical Design and Fabrication
Received: Jul. 1, 2011
Accepted: --
Published Online: Nov. 21, 2011
The Author Email: Xiao Xiao (xiao_scu@sohu.com)