Acta Optica Sinica, Volume. 26, Issue 10, 1585(2006)
Optical Properties of ZnO∶H Films Grown by Atmospheric Pressure Metal Organic Chemical Vapor Deposition (APMOCVD)
ZnO∶H thin films were prepared on cAl2O3 substrate by adding a little of H2 gas in the reaction gas when depositing ZnO films using atmospheric pressure metal organic chemical vapor deposition (APMOCVD) with carrier gas of nitrogen. Zn(C2H5)2 (DEZn) and H2O were used as Zn and O precursors, respectively. The crystallizing performance and optical properties were studied with doublecrystal Xray diffraction and photoluminescence. The full widths at half maximum of the (002) and (102) omega rocking curves of ZnO∶H films were 46.1 mrad and 81.4 mrad, respectively, indicating the high crystal quality of the films. The room temperature photoluminescence (PL) spectra showed that there was a strong ultraviolet emission at 380 nm. Meanwhile, a strong hydrogen-related bound exciton peak (I4) at 3.363 eV and its two electron satellite at 3.331 eV were observed in the low temperature PL spectra at 10 K. In addition, the thermal stability of hydrogen in ZnO∶H films were investigated by observing the intensity change of I4 peak during the annealing process. The results showed that the intensity of I4 peak decreased with the annealing temperature increasing, indicating the hydrogen would evolve out from ZnO∶H films annealed at high temperature.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optical Properties of ZnO∶H Films Grown by Atmospheric Pressure Metal Organic Chemical Vapor Deposition (APMOCVD)[J]. Acta Optica Sinica, 2006, 26(10): 1585