Chinese Optics Letters, Volume. 5, Issue 12, 709(2007)

Field enhancement analysis of an apertureless near field scanning optical microscope probe with finite element method

Weibin Chen* and Qiwen Zhan
Author Affiliations
  • Electro-Optics Graduate Program, University of Dayton, 300 College Park, Dayton, Ohio 45469-0245, USA
  • show less

    Plasmonic field enhancement in a fully coated dielectric near field scanning optical microscope (NSOM) probe under radial polarization illumination is analyzed using an axially symmetric three-dimensional (3D) finite element method (FEM) model. The enhancement factor strongly depends on the illumination spot size, taper angle of the probe, and the metal film thickness. The tolerance of the alignment angle is investigated. Probe designs with different metal coatings and their enhancement performance are studied as well. The nanometric spot size at the tip apex and high field enhancement of the apertureless NSOM probe have important potential application in semiconductor metrology.

    Tools

    Get Citation

    Copy Citation Text

    Weibin Chen, Qiwen Zhan. Field enhancement analysis of an apertureless near field scanning optical microscope probe with finite element method[J]. Chinese Optics Letters, 2007, 5(12): 709

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Received: Jul. 10, 2007

    Accepted: --

    Published Online: Dec. 12, 2007

    The Author Email: Weibin Chen (qiwen.zhan@notes.udayton.edu)

    DOI:

    Topics