Opto-Electronic Engineering, Volume. 33, Issue 6, 37(2006)
Characters of ZrO2 films deposited by electron beam evaporation at different oxygen partial pressure
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Characters of ZrO2 films deposited by electron beam evaporation at different oxygen partial pressure[J]. Opto-Electronic Engineering, 2006, 33(6): 37
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