In order to reduce the Fresnel reflection of optical surface, a method to fabricate bionic antireflective structure was proposed. Originally, silver nanoparticles were deposited on the surface of the rigid substrate based on silver mirror reaction and annealing process, and then following etching process, the motheye nanostructures with antireflective property were formed on the substrate. Optical characteristics of motheye nanostructure for random distribution and period distribution were analyzed theoretically. The results indicate that the random distributed nanostructures have a broad reflective spectrum in the visible region. In experiments, the impacts of annealing parameters and etching parameters on diameter, density and height of nanostructures were analyzed, and antireflective structures were fabricated in silicon and quartz substrate respectively. The results show that less than 4.5% in reflectance is obtained for nanostructures in silicon substrate, and the transmission is enhanced to 98.1% for nanostructures in dualside quartz substrate. In both theory and experiment, it indicates that random distributed bionic motheye structure has a high effect antireflective performance for a broad spectrum and wide angle. The proposed method has advantages of simple, lowlost and largearea fabrication of antireflective structures, and is promising for application on photoelectric device.