Acta Optica Sinica, Volume. 12, Issue 4, 359(1992)
Broadband catadioptric UV lithography lenses design
The design of a series of UV or DUV lithography lenses is described in this paper. Below 365nm region, the bandwidth of these lenses is wider than that of abroad UV lithgraphy lenses, and these lenses have higher NA also. The free-running (unnar-rowed) excimer laser or meroury-xenon short are lamp can be used as illumination-source, even the through-lens alignment system can be used in these lithography lenses.
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[in Chinese], [in Chinese], [in Chinese]. Broadband catadioptric UV lithography lenses design[J]. Acta Optica Sinica, 1992, 12(4): 359
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