Acta Optica Sinica, Volume. 16, Issue 8, 1169(1996)
Deep Submicron Excimer Laser Lithography
Experimental results of deep submicron lithography with a excimer laser are reported in this paper. With a free running KrF excimer laser, an illumination system including a light pipe uniformizer and a broadband catadioptric 1:1 projection lens with an aberration correcting planoparallel plate, the resolutions of 0.6 μm and 0.5 μm L/S patterns are produced on two resists respectively.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deep Submicron Excimer Laser Lithography[J]. Acta Optica Sinica, 1996, 16(8): 1169