Damage testing system of extreme ultraviolet radiation, which is set to filter reasonably the materials and manufacturing processes for extreme ultraviolet lithography, consists of extreme ultraviolet source, collector chamber and sample chamber. Simulations of the damage testing system is provided when image plane is at focus and out of focus, and when the ellipsoidal collector is moving and rotating. The simulation results show that depth of focus in this system is ±3 mm. When there is no typical change of average image size in image plane, the maximum moving distance of collector is ±1.2 mm and the maximum rotation angle is ±0.08°. When the collector rotates by a small angle, the image moves along a certain orientation and image moving distance is directly proportional to collector rotation angle. The results are instructive to build the damage testing system of extreme ultraviolet radiation and implement the testing.