Chinese Journal of Lasers, Volume. 40, Issue 11, 1107002(2013)
Valence Bond Structure and Mechanical Properties of CNx Films Prepared by Glow Discharge Assisted Pulsed Laser Deposition
The CNx films are deposited on monocrystalline silicon by direct current glow discharge assisted pulsed laser deposition (PLD) technique under various laser fluxes. The composition, microstructure, surface morphology, mechanical and tribological properties of the films are characterized by scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nano indenter and ball-on-disk tribometer, respectively. The results show that the films are of amorphous structure. The nitrogen atomic content of the CNx film increases from 27.7% to 34.1% with the increase of laser flux from 5.1 J/cm2 to 7.5 J/cm2. An increased area percentage of sp3C—N bond, sp2C—N bond, and a decreased area percentage of sp3C—C bond are observed in the film. An increased degree of carbon sp3 hybrid and a decreased degree of graphitization of the film are found. With the increasing of laser flux, the film hardness increases from 3.7 GPa to 5.3 GPa, the wear rate of the film decreases from 3.8×10-13 m3/(N·m) to 7.9×10-14 m3/(N·m), and the friction coefficient increases from 0.13 to 0.18, respectively.
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Zheng Xiaohua, Song Jianqiang, Yang Fanger, Chen Zhanling. Valence Bond Structure and Mechanical Properties of CNx Films Prepared by Glow Discharge Assisted Pulsed Laser Deposition[J]. Chinese Journal of Lasers, 2013, 40(11): 1107002
Category: materials and thin films
Received: Jun. 9, 2013
Accepted: --
Published Online: Oct. 24, 2013
The Author Email: Xiaohua Zheng (zhengxh@zjut.edu.cn)