Laser & Optoelectronics Progress, Volume. 50, Issue 11, 112202(2013)
Effect of Material Inhomogeneity on the Image Quality of Optical Systems with Extremely Small Aberration
In order to analyze the effect of optical material inhomogeneity on the image quality of optical systems with extremely small aberration, and guide the optimization of the optical systems, we propose a three-dimensional simulation and ray-tracing method. This method works in Zemax, using a self-defined program to build the three-dimension distribution of the material inhomogeneity. By setting the setp of the ray-tracing process and controlling the ray-tracing process, the simulation precision is enhanced. As an example, We study an optical system with numerical aperture (NA) of 0.7, wavelength λ=632.8 nm, wavefront aberration root-mean-square (RMS) value of 1.5 nm. The simulation result shows that the simulation precision of this three-dimensional simulation and ray-tracing method is obviously better than other two-dimensional methods.
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Yang Tianxing, Huang Wei, Shang Hongbo, Xu Weicai, Zhao Feifei. Effect of Material Inhomogeneity on the Image Quality of Optical Systems with Extremely Small Aberration[J]. Laser & Optoelectronics Progress, 2013, 50(11): 112202
Category: Optical Design and Fabrication
Received: Jun. 18, 2013
Accepted: --
Published Online: Sep. 17, 2013
The Author Email: Tianxing Yang (ytx123147@163.com)