Journal of Synthetic Crystals, Volume. 53, Issue 9, 1608(2024)

Study of Gas-Phase Parasitic Reaction Pathways for ZnO Thin Film Grown by MOCVD

WU Rui, HU Yang, TANG Rongfen, YANG Qian, WANG Xu, WU Yiyi*, NIE Dengpan, and WANG Huanjiang
Author Affiliations
  • [in Chinese]
  • show less

    This study utilized density functional theory (DFT) in quantum chemistry to investigate the gas-phase parasitic reaction mechanism between diethylzinc (DEZn) and tert-butanol (t-BuOH) during the metal-organic chemical vapor deposition (MOCVD) growth process of ZnO thin films. By calculating the Gibbs free energy changes along various reaction pathways at different temperatures, a comprehensive thermodynamic evaluation of key intermediates (HOZnOBut, H(ZnO)2But, HZnOH), as well as the formation of dimers (Zn2O2H4, Zn2O4H4, Zn4O4H4), and trimers (Zn3O6H6) was performed. The main objective was to identify potential pathways and products that could lead to the formation of nanoparticles, which might impede ZnO thin film growth. Research has shown that under high-temperature deposition conditions (673.15 K

    Tools

    Get Citation

    Copy Citation Text

    WU Rui, HU Yang, TANG Rongfen, YANG Qian, WANG Xu, WU Yiyi, NIE Dengpan, WANG Huanjiang. Study of Gas-Phase Parasitic Reaction Pathways for ZnO Thin Film Grown by MOCVD[J]. Journal of Synthetic Crystals, 2024, 53(9): 1608

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Received: May. 13, 2024

    Accepted: --

    Published Online: Oct. 21, 2024

    The Author Email: Yiyi WU (yiyiwu@gzmu.edu.cn)

    DOI:

    CSTR:32186.14.

    Topics