Deep Etch Binary Optics Element

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 16, Issue 12, 1796(1996)

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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A novel deep etch binary optics element with phase depth exceeded 2π is developed. The relationship between deep etch binary element and diffrative efficiency is analysed theoretically and simulated by computer. The preliminary results about characteristics of the deep etch binary optics element are obtained.

Keywords

binary optics diffrative optics element deep etch

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deep Etch Binary Optics Element[J]. Acta Optica Sinica, 1996, 16(12): 1796

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Paper Information

Category: OPTOELECTRONICS

Received: Sep. 26, 1995

Accepted: --

Published Online: Dec. 4, 2006

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DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology