Acta Optica Sinica, Volume. 38, Issue 7, 0722001(2018)
High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System
A high precision correction method of illumination field uniformity for photolithography illumination system is proposed. The correction ability and accuracy are improved by the optimization of the fingers' fore-end shape and arrangement of the finger array uniformity corrector. The simulation results show that the correction accuracy of the finger array uniformity corrector is better than 0.2%, when fingers are staggered arrangement. In addition, the correction accuracy of the finger array uniformity corrector is better than 0.16%, when fingers are chamfered, staggered and double layouts arrangement, which is about twice as high as general finger array uniformity corrector.
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Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001
Category: Optical Design and Fabrication
Received: Jan. 8, 2018
Accepted: --
Published Online: Sep. 5, 2018
The Author Email: Huang Huijie (huanghuijie@siom.ac.cn)