Acta Optica Sinica, Volume. 26, Issue 10, 1565(2006)
New TwoStep Etching Method Wiping off Crystal Tropism Influence in Laser-Induced Wet Chemical Etching
A new method, laserassisted wet twostep etching, which can wipe off the crystal tropism influence in laser induced wetchemical etching is proposed. The essential of this method is to lengthen the etching time in noncrystaltropism direction and assure the same etching degree as that in the crystaltropism direction. Theoretical analysis and experimental result show that the crystal tropism influences the etched image greatly; and the twostep method can wipe off the crystal tropism influence effectively; and also, compared with the adopted normally surface mask film and laser intensity distributing accommodation, the twostep etching method can deal with the inside crystal tropism influence, operate easily and the requirement for equipment is low. The laserassisted wet twostep etching can overcome the disadvantages of conventional ones, and wipe off the crystal tropism influence and is useful in the fabrication of specialstructured optoelectronic devices and optoelectronic integration.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. New TwoStep Etching Method Wiping off Crystal Tropism Influence in Laser-Induced Wet Chemical Etching[J]. Acta Optica Sinica, 2006, 26(10): 1565