Laser & Optoelectronics Progress, Volume. 57, Issue 3, 032202(2020)
High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography
Indium-tin-oxide (ITO) conductive films provide low resistivity, good light transmittance, and high temperature resistance; they have important applications in the field of optoelectronics. The size of the ITO electrode obtained by the existing process method is generally 10-200 μm, which limits the application of the ITO electrode in the field of micro-nano technique. This work discusses the development of a fabrication method based on the traditional wet etching process and high-precision exposure of ITO glass surface photoresist by maskless lithography. The exposure, development, and etching processes are optimized to obtain an electrode with only 2-μm width. The developed electrode has the advantages of high linearity, no undercut, and small error, thus providing a realistic reference for the application development of ITO electrode in the micro-nano field.
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Yi Yin, Zhijian Liu, Saijie Wang, Sen Wu, Zhijun Yan, Xinxiang Pan. High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography[J]. Laser & Optoelectronics Progress, 2020, 57(3): 032202
Category: Optical Design and Fabrication
Received: Jun. 11, 2019
Accepted: Aug. 12, 2019
Published Online: Feb. 17, 2020
The Author Email: Liu Zhijian (liuzhijian@dlmu.edu.cn)