Electro-Optic Technology Application, Volume. 29, Issue 3, 1(2014)

Research on Dual-band Laser High Reflection Mirror in Ultraviolet Band

CHEN Heng1... XIONG Shi-fu1, HAN Jian2 and SUN Hong-wei2 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
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    The laser in the band of 355 nm and 266 nm can be produced by 1 064 nm YAG laser through nonlinear optical frequency conversion mode. High reflection from double bands must be met by the mirror operating in the system. According to film design theory, the appropriate coating material is chosen. Based on electron beam ion assisted deposition (IAD) technology, through optimizing parameters and repeating tests, the double band mirror is manufactured on quartz substrate, the reflectivity is 97.9% at 355 nm and 96.8% at 266 nm, the laser induce damage threshold (LIDT) is 1.76 J/cm2 at 355 nm and 1.12 J/cm2 at 266 nm ultraviolet band. Test results show that all the characteristics of the mirror accord with operation requirements.

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    CHEN Heng, XIONG Shi-fu, HAN Jian, SUN Hong-wei. Research on Dual-band Laser High Reflection Mirror in Ultraviolet Band[J]. Electro-Optic Technology Application, 2014, 29(3): 1

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    Paper Information

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    Received: Apr. 17, 2014

    Accepted: --

    Published Online: Jul. 18, 2014

    The Author Email:

    DOI:

    CSTR:32186.14.

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