Acta Optica Sinica, Volume. 33, Issue 5, 505001(2013)
Exposure Developing Simulation Study of Single-Mode-Resonance Interference Lithography
A lithography method based on the single-mode-resonance (SMR) interference in the resist by employing the cylinder grating (CG) coupled structure is proposed. The CG coupled structure is used as a mask, and then the dielectric waveguide can be formed by combining CG with resist layer and substrate. Interference pattern will be generated in the resist using the specific diffraction order (±1) from the CG diffraction. The resist layer plays the role of waveguide which can enhance the light field intensity 25~50 times stronger and greatly improve the light energy utilization ratio. Through simulation, the nanostructure with period smaller than λ/3 and groove width ranging of 42~88 nm (λ/10~λ/5) can be obtained with incident light wavelength of 441 nm.
Get Citation
Copy Citation Text
Yang Zheng, Zhang Zhiyou, Li Shuhong, Gao Fuhua, Du Jinglei. Exposure Developing Simulation Study of Single-Mode-Resonance Interference Lithography[J]. Acta Optica Sinica, 2013, 33(5): 505001
Category: Diffraction and Gratings
Received: Dec. 20, 2012
Accepted: --
Published Online: Mar. 22, 2013
The Author Email: Zheng Yang (cqyangking@163.com)