Laser & Optoelectronics Progress, Volume. 57, Issue 1, 011201(2020)
Line Spacing Measurement Method Based on Image Processing
The critical dimension scanning electron microscope (CD-SEM) is a standard instrument for standardizing micro- to nano-sized line spacing samples. To improve the calibration accuracy of samples, this paper studies a measurement algorithm based on image processing technology. First, the characteristics of the developed samples are analyzed. Second, the algorithms for micro- to nano-sized line spacing measurement and linear approximation are researched and the line spacing standard samples with a single period from 100 nm to ~10 μm are measured. Finally, a nano-measuring machine is used in comparative experiments. The experimental results show that the relative error of the linear approximation algorithm is controlled within 0.45%. In contrast, the relative error obtained by the line spacing measurement algorithm is controlled within 0.35%, thus improving the measurement accuracy of the line spacing. The algorithm provides a measurement scheme for improving the reliability of the line spacing measurement instrument and ensuring the precision of semiconductor device manufacturing.
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Xiaodong Zhang, Lin Zhao, Zhiguo Han, Yanan Feng, Suoyin Li. Line Spacing Measurement Method Based on Image Processing[J]. Laser & Optoelectronics Progress, 2020, 57(1): 011201
Category: Instrumentation, Measurement and Metrology
Received: May. 13, 2019
Accepted: Jun. 24, 2019
Published Online: Jan. 3, 2020
The Author Email: Zhang Xiaodong (zxd_tju_edu@163.com)