Various X-ray opticswith an optical length of 150～500 mm are employed for beam guidance,beam alignment andmonochromatization.This paper focuses on two different types of large Xray mirrors.Thefirst optical element is a single-layer mirror which works as a total-reflection mirror inthe soft X-ray range(50～200 eV)and at a grazing incidence angle of 2°.Such a mirror isused in free-electron lasers,e.g.FLASH in Hamburg,Germany.The second mirror is amultilayer mirror,which is employed as a reflector due to its Bragg reflection for thehard X-ray range(20～50keV)and at incidence angles of 0.4～1°.Such a mirror could be used at a synchrotron storage ring,forinstance in a tomography beamline.In both cases,the mirrors are fabricated by means ofstate-of-the-art physical vapour deposition techniques,using magnetron sputtering toachieve a good optical quality for their X-ray optical application.This deposition processallows good run-to-run stability,which is crucial for the final deposition of the actualmirror on a high-quality substrate.Both the single and the multilayer mirrors have a highreflectivity for their relevant energy range,a low roughness on their surfaces and a gooduniformity of these properties over the whole optical wavelength.The investigationsdescribed here are performed by means of X-ray reflectometry(XRR),transmission electronmicroscopy(TEM),optical profilometry(OP)and atomic force microscopy(AFM).