Laser & Optoelectronics Progress, Volume. 50, Issue 3, 30005(2013)
Development of Contamination Control Techniques for EUV Optics Surfaces
The optics contamination and the contamination control strategies used in extreme ultra-violet lithography (EUVL) directly affect the performance of optics system. We summarize the main achievements in the research of optics contamination, such as carbon deposition and oxidation of optical surface, and contamination control strategies which include intellegent gas blending, protective capping layer and contamination cleaning. The challenges and key technologies are also presented.
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Lei Min, Li Xiaoping, Miao Huaikun. Development of Contamination Control Techniques for EUV Optics Surfaces[J]. Laser & Optoelectronics Progress, 2013, 50(3): 30005
Category: Reviews
Received: Nov. 19, 2012
Accepted: --
Published Online: Mar. 1, 2013
The Author Email: Min Lei (leimin2521@hotmail.com)