Infrared and Laser Engineering, Volume. 44, Issue 10, 3010(2015)

Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode

Ren Bin1,2,3, Shi Feng1,2, Guo Hui1,2, Jiao Gangcheng1,2, Hu Canglu1,2, Cheng Wei1,2, Xu Xiaobing1,2, and Wang Shufei1,2
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    The electonic structure and optical properties of standard InGaAs material, which formed the absorption layer of transferred-electron InP/InGaAs photocathode, were studied based on the density functional theory, the exchange and correlation potential energy was described by Heyd-Scuseria-Ernzerh(HSE06). First, the energy band structure of zinc blende GaAs was verified with this hybrid density functional, then the standard InGaAs bulk model was established, and dynamically optimized by self-consistent method before complex dielectric function was obtained, then the optical absorption coefficient was derivated from Kramers-Kronig relation. Finally, under the estimation of P-type standard InGaAs unequilibrium minority carriers effusion length were 0.8, 1.0, 1.2, 1.4, 1.6 and 2.0 m separately, combined with quantum efficiency formula of transferred-electron photocathode, the optimized absorption layer thickness of InP/InGaAs photocathode was derivated according to the photon energy between 0.780 260 eV and 0.820 273 eV with spacing 0.002 eV.

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    Ren Bin, Shi Feng, Guo Hui, Jiao Gangcheng, Hu Canglu, Cheng Wei, Xu Xiaobing, Wang Shufei. Design and calculation of absorption layer thickness on InP/InGaAs transferred-electron photocathode[J]. Infrared and Laser Engineering, 2015, 44(10): 3010

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    Paper Information

    Category: 光电器件与材料

    Received: Feb. 11, 2015

    Accepted: Mar. 3, 2015

    Published Online: Jan. 26, 2016

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