Laser & Optoelectronics Progress, Volume. 54, Issue 11, 111602(2017)

Properties of GaAs0.9Sb0.1 Epilayer Grown by Two Growth Models of Liquid Phase Epitaxy Technique

Xie Hao1,2, Hu Shuhong1、*, Wang Yang1,2, Huang Tiantian1,2, Pan Xiaohang1, Sun Yan1, and Dai Ning1
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  • 2[in Chinese]
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    GaAs0.9Sb0.1 epilayer is grown by two growth models of liquid phase epitaxy technique, and the two models are step-cooling and super-cooling, respectively. The crystal structure, cross-sectional image, and luminescence property of GaAs0.9Sb0.1 epilayer are studied with utilization of X-ray diffractometer, scanning electron microscope, and Raman spectometer. The results show that the growth rate of GaAs0.9Sb0.1 epilayer grown with step-cooling is slower than that with super-cooling, and GaAs0.9Sb0.1 epilayer grown by step-cooling exhibits higher-quality crystalline structure and smoother interface. However, the GaAs0.9Sb0.1 epilayer grown by the two growth models display substantially similar photoluminescence property.

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    Xie Hao, Hu Shuhong, Wang Yang, Huang Tiantian, Pan Xiaohang, Sun Yan, Dai Ning. Properties of GaAs0.9Sb0.1 Epilayer Grown by Two Growth Models of Liquid Phase Epitaxy Technique[J]. Laser & Optoelectronics Progress, 2017, 54(11): 111602

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    Paper Information

    Category: Materials

    Received: May. 16, 2017

    Accepted: --

    Published Online: Nov. 17, 2017

    The Author Email: Shuhong Hu (hush@mail.sitp.ac.cn)

    DOI:10.3788/lop54.111602

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