Acta Photonica Sinica, Volume. 41, Issue 6, 654(2012)

Offaxis Projection System Based on Three Reflectors with Zernike Polynomial Surfaces and Even Aspheric Surfaces

SUN Wenjun1,2、*, ZHAO Liping3, SUN Jingnan1,2, LI Juan1,2, LI Mengyang1,2, and ZHI Hongwu1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Three offaxis projection systems based on even aspheric surface reflectors and Zernike polynomial surface reflectors are designed using wave front aberrations analysis and modulation transfer function. The projection system consists of three reflectors, in which the number of Zernike polynomial surface reflectors is different. The first mirror M1 is concave to reduce the size of the second mirror and obtain high contrast ratio. The second mirror M2 and the third mirror M3 are convex to achieve a shorter projection distance and little system aberration. Optical performance analysis show that the system based on three Zernike polynomial surface reflector is the best, the MTF is more than 60% at 60 lp/mm and system distortion is less than 2.0% under the condition of Fnumber=2.8, the magnification of 80. Compared results with references show that the designed system based on three Zernike polynomial surface reflectors can more easily eliminate system aberrations, shorten system thickness and increase the visual angle and relative aperture.

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    SUN Wenjun, ZHAO Liping, SUN Jingnan, LI Juan, LI Mengyang, ZHI Hongwu. Offaxis Projection System Based on Three Reflectors with Zernike Polynomial Surfaces and Even Aspheric Surfaces[J]. Acta Photonica Sinica, 2012, 41(6): 654

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    Paper Information

    Received: Nov. 7, 2011

    Accepted: --

    Published Online: Jun. 19, 2012

    The Author Email: Wenjun SUN (swjgood0139@sina.com)

    DOI:10.3788/gzxb20124106.0654

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