Acta Photonica Sinica, Volume. 41, Issue 6, 654(2012)
Offaxis Projection System Based on Three Reflectors with Zernike Polynomial Surfaces and Even Aspheric Surfaces
Three offaxis projection systems based on even aspheric surface reflectors and Zernike polynomial surface reflectors are designed using wave front aberrations analysis and modulation transfer function. The projection system consists of three reflectors, in which the number of Zernike polynomial surface reflectors is different. The first mirror M1 is concave to reduce the size of the second mirror and obtain high contrast ratio. The second mirror M2 and the third mirror M3 are convex to achieve a shorter projection distance and little system aberration. Optical performance analysis show that the system based on three Zernike polynomial surface reflector is the best, the MTF is more than 60% at 60 lp/mm and system distortion is less than 2.0% under the condition of Fnumber=2.8, the magnification of 80. Compared results with references show that the designed system based on three Zernike polynomial surface reflectors can more easily eliminate system aberrations, shorten system thickness and increase the visual angle and relative aperture.
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SUN Wenjun, ZHAO Liping, SUN Jingnan, LI Juan, LI Mengyang, ZHI Hongwu. Offaxis Projection System Based on Three Reflectors with Zernike Polynomial Surfaces and Even Aspheric Surfaces[J]. Acta Photonica Sinica, 2012, 41(6): 654
Received: Nov. 7, 2011
Accepted: --
Published Online: Jun. 19, 2012
The Author Email: Wenjun SUN (swjgood0139@sina.com)