Acta Photonica Sinica, Volume. 50, Issue 9, 0930001(2021)
Electron Temperature Diagnostics in Microwave Plasma Chemical Vapor Deposition by Optical Emission Spectroscopy
The electron temperature of the Ar/CH4 plasma was diagnosed under the pressure of 40~80 Pa and the microwave power of 400~800 W by Optical Emission Spectrometry (OES). The experimental results show that the electron temperature obtained by the OES is between 0.75 eV and 4 eV under the above experimental conditions. Through measurement of Ar or CH4 plasma, it is feasible to use the OES method in microwave coaxial plasma with carbon-containing gas. This research can further expand the application of the OES method in the PECVD field.
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Chi CHEN, Chaoyang ZHANG, Wenjie FU, Dun LU, Tongxing HUANG, Yang YAN. Electron Temperature Diagnostics in Microwave Plasma Chemical Vapor Deposition by Optical Emission Spectroscopy[J]. Acta Photonica Sinica, 2021, 50(9): 0930001
Category: Spectroscopy
Received: Mar. 21, 2021
Accepted: May. 25, 2021
Published Online: Oct. 22, 2021
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