Infrared Technology, Volume. 42, Issue 8, 752(2020)

Micro-channel Plate Etching Technology in Lye

Zhengjun ZHANG*, Jingwen LI, Pengjie NIU, Xiaoqing CONG, Xiangbiao QIU, and Jian WANG
Author Affiliations
  • [in Chinese]
  • show less

    In this study, the effect of lye corrosion time on the gain of a microchannel plate is investigated. By adjusting the lye-etching time, the concentration of alkali metals and the roughness of the channel inner wall are visualized via X-ray photoelectron spectroscopy and atomic force microscopy. Results show that reducing the lye-etching time can reduce the loss of alkali metal elements in the inner wall of the microchannel plate without affecting its roughness, thereby improving the secondary electron emission capacity and the microchannel plate gain. Further tests show that higher alkali metals can improve the gain of both the microchannel plates and image intensifier tubes, whereas the noise coefficient in the image intensifier tube does not increase with reduced lye-etching time.

    Tools

    Get Citation

    Copy Citation Text

    ZHANG Zhengjun, LI Jingwen, NIU Pengjie, CONG Xiaoqing, QIU Xiangbiao, WANG Jian. Micro-channel Plate Etching Technology in Lye[J]. Infrared Technology, 2020, 42(8): 752

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Jun. 8, 2020

    Accepted: --

    Published Online: Nov. 6, 2020

    The Author Email: Zhengjun ZHANG (julle446@163.com)

    DOI:

    Topics