Ion beam sputtering induced experimental method was used to assist the silver film deposition on monocrystalline silicon(100) and the induced deposition effects of low energy Ar+ ion beams was discussed with different ion energies, fluxes and substrate temperatures at the ion incidence angle of 30°. The experiment indicated that temperature change had significant influence on the nano microstructure size and roughness. When the substrate temperature was between 32℃ and 100℃, the closely packed nano pyramid microstructures were obtained with grains consistent in size; when the substrate temperature rose between 32℃ and 200℃, the microstructures transverse size (λc) of samples increased rapidly, but the roughness decreased at first (32~100℃), and then increased rapidly (100~200℃). When ion flux density was within 15~45 μA/cm2 with an ion beam energy of 1 400 eV, the increase of ion beam flux densities at the same deposition temperature could achieve the nano crystal grains with unchanged lateral sizes and more compact arrangement, and slightly increased roughness; when ion beam energy was within 1 000~1 800 eV with an ion beam flux of 15 μA/cm2, the increase of ion beam energies could lead silver nano microstructure sizes to increase, and the surface roughness of samples to increase first and then decrease slowly. The pattern transformation of self-organizing nano-structure results from the interaction of spurting roughening and relaxation mechanism.