In order to obtain a reliable method for the fabrication of nanometer metal tips, the fabrication process for pyramidal Ni tips based on microelectroforming technology was designed and verified experimentally. First, silicon templates with inverted pyramidal pits were fabricated on (100) single crystal silicon wafers using anisotropic etching. Then, a 200 nm thick Ni thin film as seed layer was deposited onto the templates by magnetron sputtering combined with lift-off technology, followed by a Ni microelectroforming step. Finally, the pyramidal Ni nanotips were released by etching the silicon template in KOH solution. The results show that the relative error of square etch-windows on the silicon templates can be reduced by approximately 9% using inductively-coupled plasma dry etching instead of hydrofluoric acid etching in the patterning of the SiO2 etch-windows. The bottom side length of the pyramidal Ni nanotip is approximately 140 μm, and the smallest radius of curvature of the nanotips is 54 nm. The replication accuracy from the templates to the nanotips reached as high as 99%. The results show that the template microelectroforming technique can be used to achieve stable and mass fabrication of Ni nanotips, which reduces the cost and lays a solid foundation for the application of metal nanotips.