Infrared and Laser Engineering, Volume. 36, Issue 2, 214(2007)

Influence of PECVD generated SiO2 and SiNx layers on p-GaN

[in Chinese]1、*, [in Chinese]2,3, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • show less
    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese]. Influence of PECVD generated SiO2 and SiNx layers on p-GaN[J]. Infrared and Laser Engineering, 2007, 36(2): 214

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: 红外技术及应用

    Received: Sep. 15, 2006

    Accepted: Oct. 20, 2006

    Published Online: Sep. 18, 2007

    The Author Email: (Email:chenyu.nm@163.com)

    DOI:

    Topics