Chinese Optics Letters, Volume. 7, Issue 4, 04274(2009)

Efficient 1.3-\mum electroluminescence from high concentration boron-diffused silicon p+-n junctions

Ting Chen, Guangzhao Ran, Liping You, Huabo Zhao, and Guogang Qin
Author Affiliations
  • State Key Lab for Mesoscopic Physics and School of Physics, Peking University, Beijing 100871E-mail: rangz@pku.edu.cn
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    Electroluminescence peaking at 1.3 \mum is observed from high concentration boron-diffused silicon p+-n junctions. This emission is efficient at low temperature with a quantum efficiency 40 times higher than that of the band-to-band emission around 1.1 \mum, but disappears at room temperature. The 1.3-\mum band possibly originates from the dislocation networks lying near the junction region, which are introduced by high concentration boron diffusion.

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    Ting Chen, Guangzhao Ran, Liping You, Huabo Zhao, Guogang Qin. Efficient 1.3-\mum electroluminescence from high concentration boron-diffused silicon p+-n junctions[J]. Chinese Optics Letters, 2009, 7(4): 04274

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    Paper Information

    Received: Dec. 17, 2008

    Accepted: --

    Published Online: Apr. 27, 2009

    The Author Email:

    DOI:10.3788/COL20090704.0274

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