Acta Optica Sinica, Volume. 35, Issue 6, 611003(2015)
Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality
An analytical analysis method for the impact of polarization aberration of projection lens on aerial image of alternating phase-shift mask (Alt-PSM) is proposed. Analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived. Analytical analysis for effect of every Pauli- Zernike polarization aberration to aerial image is realized. The linear relationships between IPE and odd items of Pauli-Zernike polarization aberrations, as well as that between BFS and even items of Pauli- Zernike polarization aberrations are established. The validity of analytical results is verified by numerical simulations, and the accuracy of linear relationships is assessed by the least square method.
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Shen Lina, Li Sikun, Wang Xiangzhao, Yan Guanyong. Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality[J]. Acta Optica Sinica, 2015, 35(6): 611003
Category: Imaging Systems
Received: Nov. 24, 2014
Accepted: --
Published Online: May. 28, 2015
The Author Email: Lina Shen (shenlina@siom.ac.cn)