Acta Optica Sinica, Volume. 35, Issue 6, 611003(2015)

Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality

Shen Lina1,2,3、*, Li Sikun1,2, Wang Xiangzhao1,2, and Yan Guanyong1,2
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    An analytical analysis method for the impact of polarization aberration of projection lens on aerial image of alternating phase-shift mask (Alt-PSM) is proposed. Analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived. Analytical analysis for effect of every Pauli- Zernike polarization aberration to aerial image is realized. The linear relationships between IPE and odd items of Pauli-Zernike polarization aberrations, as well as that between BFS and even items of Pauli- Zernike polarization aberrations are established. The validity of analytical results is verified by numerical simulations, and the accuracy of linear relationships is assessed by the least square method.

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    Shen Lina, Li Sikun, Wang Xiangzhao, Yan Guanyong. Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality[J]. Acta Optica Sinica, 2015, 35(6): 611003

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    Paper Information

    Category: Imaging Systems

    Received: Nov. 24, 2014

    Accepted: --

    Published Online: May. 28, 2015

    The Author Email: Lina Shen (shenlina@siom.ac.cn)

    DOI:10.3788/aos201535.0611003

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