Spectroscopy and Spectral Analysis, Volume. 29, Issue 6, 1486(2009)

Effect of Ce3+ Implantation on Photoluminescence Intensity of Si Nanocrystals Embedded in Superlattices

DU Yu-fan*, YI Li-xin, WANG Shen-wei, and WU Yang
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    In the present paper, SiO/SiO2 superlattices samples were prepared on Si substrates by electron beam evaporation.The samples were annealed in nitrogen atmosphere at high temperature subsequently.And then, Ce3+ ions with a dose of 2.0×1014 and 2.0×1015 cm-2 respectively were implanted into these samples with formed Si nanocrystals. The photoluminescence (PL) spectra showed that the PL intensities of samples with Ce3+ implanting dropped sharply compared with the samples without Ce3+ implanting. The PL intensity increased gradually with increasing re-annealing temperature, but dropped again when the temperature exceeded 600 ℃. The PL intensity even could be higher than that of samples without Ce3+ implanting if only the dose of Ce3+ was 2.0×1014 cm-2. When the dose of Ce3+ was 2.0×1015 cm-2, the PL intensity couldn’t exceed that of samples without Ce3+ implanting even when the re-annealing temperature was 600 ℃. Further investigations showed that the varieties of the PL intensities were mainly dependent on the re-annealing temperature, which had the best point at 600 ℃, and the dose of Ce3+ had the right value. Furthermore, the experiment results proved that there was energy transfer from Ce3+ to Si nanocrystals in this kind of structure.

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    DU Yu-fan, YI Li-xin, WANG Shen-wei, WU Yang. Effect of Ce3+ Implantation on Photoluminescence Intensity of Si Nanocrystals Embedded in Superlattices[J]. Spectroscopy and Spectral Analysis, 2009, 29(6): 1486

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    Paper Information

    Received: Oct. 10, 2008

    Accepted: --

    Published Online: May. 26, 2010

    The Author Email: Yu-fan DU (05121813@bjtu.edu.cn)

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