Acta Photonica Sinica, Volume. 45, Issue 6, 631004(2016)
Total Reflection Amorphous Carbon Mirrors in EUV and Soft X-ray Range
The samples were fabricated using high vacuum direct current magnetron sputtering system. The layer thicknesses, roughness and densities of samples were measured by X-ray grazing incidence reflection equipment. Surface roughness were measured by AFM (Atomic Force Microscope ). The reflectivity properties of total reflection amorphous carbon mirrors fabricated under different working pressures were characterized using synchrotron radiation. The measured results show that the properties of total reflection amorphous carbon mirrors fabricated under 0.40 Pa working pressures are superior to that fabricated under 0.67 Pa working pressures. At grazing angle 4.5°, total reflection amorphous carbon mirrors show high flat reflection beyond wavelength of 5nm while reflection sharply decrease within 5nm wavelength. Fitting results indicate that the densities of fabricated total reflection amorphous carbon mirrors is the reason which causes the actual reflection lower than designed reflection.
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TAN Mo-yan, JIANG Li, WANG Zhan-shan. Total Reflection Amorphous Carbon Mirrors in EUV and Soft X-ray Range[J]. Acta Photonica Sinica, 2016, 45(6): 631004
Received: Dec. 14, 2015
Accepted: --
Published Online: Jul. 26, 2016
The Author Email: Mo-yan TAN (moyantan@163.com)