Acta Optica Sinica, Volume. 2, Issue 1, 92(1982)
Discharge analysis in the mixture of rare gas and molecule including halogen
In this paper, the conditions for the initiation of a high-pressure uniform glow discharge was analysed, and the minimal preionized initial electron density and the optimum seed gas fraction was given. For the usual experimental conditions for a discharge excited XeF laser, the charged particle density under the steady-state discharge has been calculated. Following these obtained values, we have also discussed the difficulties in continuous operation.
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FU SHUFEN, CHEN JIANWEN. Discharge analysis in the mixture of rare gas and molecule including halogen[J]. Acta Optica Sinica, 1982, 2(1): 92