Acta Optica Sinica, Volume. 2, Issue 1, 92(1982)

Discharge analysis in the mixture of rare gas and molecule including halogen

FU SHUFEN and CHEN JIANWEN
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    In this paper, the conditions for the initiation of a high-pressure uniform glow discharge was analysed, and the minimal preionized initial electron density and the optimum seed gas fraction was given. For the usual experimental conditions for a discharge excited XeF laser, the charged particle density under the steady-state discharge has been calculated. Following these obtained values, we have also discussed the difficulties in continuous operation.

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    FU SHUFEN, CHEN JIANWEN. Discharge analysis in the mixture of rare gas and molecule including halogen[J]. Acta Optica Sinica, 1982, 2(1): 92

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    Paper Information

    Category: Rapid communications

    Received: Dec. 8, 1980

    Accepted: --

    Published Online: Sep. 15, 2011

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