Chinese Journal of Lasers, Volume. 26, Issue 3, 257(1999)

Minimum Excited Threshold in Electron Trapping Materials

[in Chinese]1,2, [in Chinese]1,2, [in Chinese]1,2, [in Chinese]1,2, [in Chinese]1,2, [in Chinese]1,2, and [in Chinese]1,2
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    By means of projecting a reference light and measuring the light on the photocathode of a streak camera, the minimum excited threshold in electron trapping materials can be measured. The infrared minimum excited threshold of CaS∶Eu, Sm is measured to be less than 4.8×10 -9 J/mm 2 by a visible streak camera. The minimum detectable energy density of the camera is less than 8.3×10 -10 J/mm 2 (532 nm). The phosphor investigated is efficiently stimulated with the 1.064 μm photons from a pulsed CPM Nd∶YAG laser. According to the result, it is shown that this kind of novel materials might be used in the ETM based infrared photocathodes and other fields.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Minimum Excited Threshold in Electron Trapping Materials[J]. Chinese Journal of Lasers, 1999, 26(3): 257

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    Paper Information

    Category: materials and thin films

    Received: Oct. 20, 1997

    Accepted: --

    Published Online: Aug. 9, 2006

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