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Acta Optica Sinica, Volume. 13, Issue 10, 956(1993)

Microstructure analysis of thin films deposited by ractive ion plating

[in Chinese]1, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    There are distinct differences in microstructure between thin films deposited by reactive evaporation and by reactive ion plating. Cross sections of TiO2 single layer thin films and TiO2/ SiO2 multilayer stacks deposited by reactive ion plating have been investigated by transmission electron microscopy; analyses of TiO2 thin films by Raman spectroscopy and by RBS is prestented in this paper.

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    microstructure analysisoptical thin filmreactive ion plating deposition
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    [in Chinese], [in Chinese], [in Chinese]. Microstructure analysis of thin films deposited by ractive ion plating[J]. Acta Optica Sinica, 1993, 13(10): 956

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    Paper Information

    Category: Rapid communications

    Received: Oct. 26, 1992

    Accepted: --

    Published Online: Dec. 7, 2007

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology