Acta Optica Sinica, Volume. 33, Issue 3, 323002(2013)

Design and Fabrication of 650 nm Arrayed Waveguide Grating

Han Chao*, Yue Yuanbin, Zhao Shimin, Chen Changming, and Zhang Daming
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  • [in Chinese]
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    Because “the last kilometer” problem of the optical communication network is expected to be solved by the 650 nm polymer optical fiber system, a 16×16 channel polymer array waveguide grating (AWG) wavelength division multiplexer is successfully fabricated to match the system. The design of the device is chosen as rectangular waveguide structure, while the refractive indices of the core layer and cladding layer are selected as 1.4888 and 1.482, respectively. By OptiBPM software, it is obtained that the channel insert loss is from 2.3 dB to 5.1 dB, the crosstalk level is -24 dB, and the channel spacing is 1.6 nm. For the fabrication of device, the polymethyl methacrylate (PMMA) material is choosed which is synthesized in our laboratory. By the ultraviolet (UV) lithography and inductively coupled plasma (ICP) etching process, a fine waveguide morphology is obtained, and finally the sample′s area is 4 cm×3 cm. The polymer optical fiber (POF) is used to couple the 650 nm visible light into AWG device for testing and excellent multiplexing/de-multiplexing performances are achieved. The AWG wavelength division multiplexer in red-light wave band will play an important role in the future optical communication.

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    Han Chao, Yue Yuanbin, Zhao Shimin, Chen Changming, Zhang Daming. Design and Fabrication of 650 nm Arrayed Waveguide Grating[J]. Acta Optica Sinica, 2013, 33(3): 323002

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    Paper Information

    Category: Optical Devices

    Received: Sep. 20, 2012

    Accepted: --

    Published Online: Jan. 16, 2013

    The Author Email: Chao Han (stefseek@yahoo.com.cn)

    DOI:10.3788/aos201333.0323002

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