To obtain a high-performance ultraviolet laser thin film, developing one that achieves accurate measurement of absorption loss is essential. In this study, Ta2O5 thin films with different absorptivities were deposited on fused quartz substrates using an ion-beam sputtering technique and by changing the oxygen flow. Ta2O5 thin films were used as high refractive index materials, and UV high reflectance absorption thin films of 355 nm were developed. Two types of 355-nm absorption thin films were prepared on fused quartz substrates using an ion-beam sputtering deposition technique. The transmissivity, reflectivity, and absorptivity at a wavelength of 355 nm were 0.1%, 95.0%, and 4.9% for 5% UV absorption spectra, respectively, whereas those at the wavelength of 355 nm were 0.1%, 87.4% and 12.5% for 12% UV absorption spectra, respectively. The experimental results show that the preparation of high reflectance thin films of 355 nm with different absorptivity can be prepared by ion-beam sputtering deposition. This is of great significance to the calibration of UV thin film weak absorption measuring instruments based on photothermal deflection measurement technology.