Opto-Electronic Engineering, Volume. 40, Issue 9, 68(2013)

Analysis of the Ruling Error Requirements for Echelle Grating

DING Weitao1...2,*, HUANG Yuanshen1,2, ZHANG Dawei1,2, and YANG Haima12 |Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    Echelle grating is used extensively in spectral instruments owing to its advantages, such as the advanced intrinsic dispersion and resolving power. But while ruling the echelle grating, there may be some periodic components of spacing errors which will seriously affect the performance of grating diffraction and lead to defects of the diffraction effects. In response to this situation, the effect of grating’s line error on diffraction spectrum, diffraction order, wavefront error, the intensity of the rowland ghost line and the intensity of stray light was proposed. What’s more, a method for analyzing the grating’s line error from the aspect of the diffraction efficiency was proposed. Under certain conditions, the ruling errors for meeting every kind of requests are 1 265.8 nm, 352 nm, 37 nm, 112 nm, 3.4 nm respectively, which provides a direct and important reference for the ruling accuracy before ruling an echelle grating.

    Tools

    Get Citation

    Copy Citation Text

    DING Weitao, HUANG Yuanshen, ZHANG Dawei, YANG Haima. Analysis of the Ruling Error Requirements for Echelle Grating[J]. Opto-Electronic Engineering, 2013, 40(9): 68

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Apr. 20, 2013

    Accepted: --

    Published Online: Sep. 17, 2013

    The Author Email: Weitao DING (dingweitao@gmail.com)

    DOI:10.3969/j.issn.1003-501x.2013.09.012

    Topics