Chinese Journal of Quantum Electronics, Volume. 22, Issue 1, 102(2005)

Preparation and application of silicon nitride passivation film

[in Chinese]1... [in Chinese]1, [in Chinese]1, [in Chinese]1 and [in Chinese]2 |Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    The Si3N4 passivation films were deposited on the UHF high power semiconductor transistor chip by ECR-PECVD and the chip was passivated. The electric properties of passivated chip were analyzed. The results show that the electric properties of semiconductor chip have been improved, in which the reverse breakdown voltage is increased and the reverse leakage current is reduced. The ratio of finished product has been improved.

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preparation and application of silicon nitride passivation film[J]. Chinese Journal of Quantum Electronics, 2005, 22(1): 102

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Oct. 23, 2003

    Accepted: --

    Published Online: May. 15, 2006

    The Author Email:

    DOI:

    Topics