The study of SiH<sub>4</sub>N<sub>2</sub>gas discharge plasma with LIF

[in Chinese]; [in Chinese]; [in Chinese]

Acta Optica Sinica, Volume. 10, Issue 4, 316(1990)

The study of SiH₄N₂gas discharge plasma with LIF

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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Mixed SiH4/N2 gas radio-frequency (RF) discharge plasma has been studied with laserr induced fluorescence (LIF). The intermediate species Si2 has been detected, and detection of Si2 in SiH4 RF discharge decomposition has not been reparted before.

Keywords

chemical vapor deposition plasma radio-frequency discharge decomposition

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316

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Paper Information

Category: Lasers and Laser Optics

Received: Jan. 16, 1989

Accepted: --

Published Online: Nov. 12, 2007

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology