Laser & Optoelectronics Progress, Volume. 58, Issue 15, 1516025(2021)
Progress of Doping in Ga2O3 Materials
Compared with silicon carbide (SiC) and gallium nitride (GaN), gallium oxide (Ga2O3) has the advantages of larger band gap width, stronger breakdown field strength, larger absorption cutoff edge, and lower growth cost. Doping technique is an effective method of optimizating physical properties of materials, which can broaden the application of Ga2O3 in different fields. In this paper, the progress of rare earth and other elements doped Ga2O3 in recent years are reviewed and the luminescence characteristics of rare earth doped Ga2O3 are analyzed. Finally, the research direction of rare earth doped Ga2O3 and p-type Ga2O3 are prospected.
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Dan Wang, Xiaodan Wang, Hai Ma, Huajun Chen, Hongmin Mao, Xionghui Zeng. Progress of Doping in Ga2O3 Materials[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516025
Category: Materials
Received: Mar. 11, 2021
Accepted: May. 8, 2021
Published Online: Jul. 28, 2021
The Author Email: Wang Xiaodan (xdwang0416@163.com)