Acta Optica Sinica, Volume. 40, Issue 22, 2216001(2020)
Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)
Highly dispersed silica (SiO2) sol was prepared in a basic catalyst system using tetraethoxysilane, ethanol, and ammonium hydroxide as the precursor, solvent, and catalyst, respectively. SiO2 antireflective films with fourth harmonic generation antireflection at 266 nm were prepared by dip coating each film in different concentrations of SiO2 sol, and the properties of the as-prepared film were determined. Results show that the fabricated film pulled up at a speed of 4.5 cm·min -1 from the highest concentration SiO2 sol exhibited the best performance. The film was characterized by a maximum transmittance of 99.307% at 266 nm, surface roughness of 1.339 nm, and excellent stability.
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Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001
Category: Materials
Received: Jul. 6, 2020
Accepted: Jul. 31, 2020
Published Online: Oct. 25, 2020
The Author Email: Shen Bin (bingo2011@siom.ac.cn)