With the development of nano fabrication technology, metasurfaces have shown unprecedented advantages over traditional optical designs in controlling electromagnetic waves at subwavelength scale. A dual-wavelength metasurface operating in two orthogonal polarization states based on the dielectric silicon nanopillars was proposed. The metasurface could realize anomalous reflective wavefront manipulation via the geometric phase gradient resulting from the reflection anisotropy for different incident polarizations. The proposed design also achieved positive and negative grayscale imaging arrays for dual-polarization and dual-wavelength incidence. This approach paves the way for integrated multifunctional photonic technologies based on metasurfaces.