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Advanced Photonics, Volume. 5, Issue 5, 059801(2023)

Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)

Dazhao Zhu1, Liang Xu2, Chenliang Ding1, Zhenyao Yang1, Yiwei Qiu1, Chun Cao1, Hongyang He3, Jiawei Chen3, Mengbo Tang1, Lanxin Zhan1, Xiaoyi Zhang1, Qiuyuan Sun1, Chengpeng Ma1, Zhen Wei1, Wenjie Liu1,2, Xiang Fu4, Cuifang Kuang1,2, Haifeng Li1,2, and Xu Liu1,2
Author Affiliations
  • 1Zhejiang Lab, Research Center for Intelligent Chips and Devices, Hangzhou, China
  • 2Zhejiang University, College of Optical Science and Engineering, State Key Laboratory of Modern Optical Instrumentation, Hangzhou, China
  • 3Zhejiang University, College of Control Science and Engineering, State Key Laboratory of Industrial Control Technology, Hangzhou, China
  • 4Zhejiang Lab, Research Center for Humanoid Sensing, Hangzhou, China
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    The erratum lists corrections to the published article.

    This article [Adv. Photon.4(6), 066002 (2022) doi: 10.1117/1.AP.4.6.066002 was originally published on 23 November 2022 with some minor errors.

    No reported results were affected by the errors. The article was corrected and republished on 22 September 2023.

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    Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, Cuifang Kuang, Haifeng Li, Xu Liu. Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral photoinhibition lithography (Erratum)[J]. Advanced Photonics, 2023, 5(5): 059801

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    Paper Information

    Received: --

    Accepted: --

    Published Online: Oct. 23, 2023

    The Author Email:

    DOI:10.1117/1.AP.5.5.059801

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology